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ISBN: 0824790243Издательство: CRC
Год издания: 2007
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including A· Immersion Lithography A· 157nm Lithography A· Electron Projection Lithography (EPL) A· Extreme Ultraviolet (EUV) Lithography A· Imprint Lithography A· Photoresists for 193nm and Immersion Lithography A· Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques,...